Negative photoresists for optical lithography. - Jane M. Shaw; Jeffrey D. Gelorme; Nancy C. LaBianca; Will E. Conley; Steven J. Holmes (IBM J. Res. Dev., 1997)

Integrated, variable-reluctance magnetic minimotor. - Eugene J. O'Sullivan; Emanuel I. Cooper; Lubomyr T. Romankiw; Keith T. Kwietniak; Philip Louis Trouilloud; Jean Horkans; Christopher V. Jahnes; Inna V. Babich; Sol Krongelb; Suryanarayan G. Hegde; James A. Tornello; Nancy C. LaBianca; et al. (IBM J. Res. Dev., 1998)