Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches. - Clemens Heitzinger; Wolfgang Pyka; Naoki Tamaoki; Toshiro Takase; Toshimitsu Ohmine; Siegfried Selberherr (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2003)