On the Effect of Cationic Surfactants in the Rinse to Reduce Pattern Collapse in High Aspect Ratio Patterning of Photoresists. - Karina Grundke; Astrid Drechsler; Nicole Petong; Cornelia Bellmann; Manfred Stamm; Odo Wunnicke; Jens Reichelt; Iris Mäge; B. Pinter; T. Pearce; M. Voigt (ICMENS, 2005)