An SEM/STM based nanoprobing and TEM study of breakdown locations in HfO2/SiOx dielectric stacks for failure analysis. - Kalya Shubhakar; Michel Bosman; O. A. Neucheva; Y. C. Loke; Nagarajan Raghavan; R. Thamankar; Alok Ranjan 001; Sean J. O'Shea; Kin Leong Pey (Microelectron. Reliab., 2015)