Influence of nitradation in ultra-thin oxide on the gate current degradation of N and PMOS devices. - M. Fadlallah; C. Petit; A. Meinertzhagen; Gérard Ghibaudo; M. Bidaud; O. Simonetti; F. Guyader (Microelectron. Reliab., 2003)

Low voltage SILC and P- and N-MOSFET gate oxide reliability. - Christian Petit; A. Meinertzhagen; Damien Zander; O. Simonetti; M. Fadlallah; T. Maurel (Microelectron. Reliab., 2005)