Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach. - Shreya Kundu; D. H. van Doip; Tom Schram; Quentin Smets; S. Banerjee; Benjamin Groven; Daire Cott; Stefan Decoster; P. Bezard; F. Lazzarino; K. Banerjee; Souvik Ghosh 001; et al. (VLSI Technology and Circuits, 2023)