ALD Ta2O5 and Hf-doped Ta2O5 for BEOL compatible MIM. - D. H. Triyoso; Wenke Weinreich; Konrad Seidel; Mark G. Nolan; Patrick Polakowski; D. Utess; Susanne Ohsiek; K. Dittmar; M. Weisheit; M. Licbau; R. Fox (ICICDT, 2014)

ALD ZrO2 processes for BEoL device applications. - Wenke Weinreich; Konrad Seidel; Patrick Polakowski; Stefan Riedel; Lutz Wilde; Dina H. Triyoso; Mark G. Nolan (ICICDT, 2014)

Impact of field cycling on HfO2 based non-volatile memory devices. - Uwe Schroeder; Milan Pesic; Tony Schenk; Halid Mulaosmanovic; Stefan Slesazeck; Johannes Ocker; Claudia Richter; Ekaterina Yurchuk; K. Khullar; Johannes Müller; Patrick Polakowski; E. D. Grimley; et al. (ESSDERC, 2016)

La-doped ZrO2 based BEoL decoupling capacitors. - Wenke Weinreich; Konrad Seidel; Patrick Polakowski; Maximilian Drescher; A. Gummenscheimer; Mark G. Nolan; L. Cheng; D. H. Triyoso (ICICDT, 2016)