Interface engineering of Si1-xGex gate stacks for high performance dual channel CMOS. - ChoongHyun Lee; Richard G. Southwick; Shogo Mochizuki; Paul Jamison; Ruqiang Bao; Rajan Kumar Pandey; Aniruddha Konar; Takashi Ando; Vijay Narayanan; Bala Haran; Hemanth Jagannathan (ASICON, 2017)

General Statistical Model for Dielectric Breakdown Including Reverse Area Scaling - The Role of Area-Dependent Dynamic Competition. - Ernest Y. Wu; Takashi Ando; Paul Jamison (IRPS, 2024)

Modulating Competition between Defect Generation and Annihilation in Dielectric Breakdown Showing a Full Range of Reverse, Diminishing, and Forward Area Scaling Trends. - Ernest Y. Wu; Paul Jamison; Steven Consiglio; Takaaki Tsunomura; Takashi Ando (IRPS, 2025)