Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2 based ferroelectric capacitors on reliability performance. - Ruben Alcala; Furqan Mehmood; Pramoda Vishnumurthy; Terence Mittmann; Thomas Mikolajick; Uwe Schroeder (IMW, 2022)

Ferroelectric HfO2-based Capacitors for FeRAM: Reliability from Field Cycling Endurance to Retention (invited). - Pramoda Vishnumurthy; Ruben Alcala; Thomas Mikolajick; Uwe Schroeder; Luis Azevedo Antunes; Alfred Kersch (IRPS, 2024)