Improving Ge-rich GST ePCM reliability through BEOL engineering. - Andrea Redaelli; Anna Gandolfo; Giulia Samanni; Enrico Gomiero; Elisa Petroni; Luca Scotti; Andrea Lippiello; Paolo Mattavelli; J. Jasse; D. Codegoni; A. Serafini; Rossella Ranica; et al. (ESSDERC, 2021)

Unlimited Bi-directional Back-Bias in FD-SOI Technology With New Dual Isolation Integration. - R. Berthelon; Olivier Weber; F. Ibars; B. Revel; C. Borowiak; J. C. Grenier; B. Dumont; S. Desmoulins; P. O. Sassoulas; P. Ferreira; S. Chouteau; S. Niel; et al. (VLSI Technology and Circuits, 2024)