Lithography Options for the 32 nm Half Pitch Node and Beyond. - Kurt Ronse; Philippe Jansen; Roel Gronheid; Eric Hendrickx; Mireille Maenhoudt; Vincent Wiaux; Mieke Goethals; R. Jonckheere; Geert Vandenberghe (IEEE Trans. Circuits Syst. I Regul. Pap., 2009)