Investigation of stress in shallow trench isolation using UV micro-Raman spectroscopy. - Kai F. Dombrowski; B. Dietrich; Ingrid De Wolf; R. Rooyackers; G. Badenes (Microelectron. Reliab., 2001)

Migrating from planar to FinFET for further CMOS scaling: SOI or bulk? - Thomas Chiarella; Liesbeth Witters; Abdelkarim Mercha; Christoph Kerner; Rok Dittrich; Michal Rakowski; Claude Ortolland; Lars-Åke Ragnarsson; Bertrand Parvais; An De Keersgieter; Stefan Kubicek; Augusto Redolfi; et al. (ESSCIRC, 2009)

Beyond-Si materials and devices for more Moore and more than Moore applications. - Nadine Collaert; AliReza Alian; Hiroaki Arimura; Geert Boccardi; Geert Eneman; Jacopo Franco; Tsvetan Ivanov; Dennis Lin; Jérôme Mitard; S. Ramesh; R. Rooyackers; Marc Schaekers; et al. (ICICDT, 2016)