Impact of Al-based Dipole Formation on Gate Stack Integrity and Reliability. - Bruno Coppolelli; Davide Cornigli; Zheyuan Chen; Andrea Padovani; Sara Vecchi; Yanliu Dang; Luc Thomas; Luca Vandelli; Jianxin Lei; Naomi Yoshida; Renu Whig; Federico Nardi; et al. (IRPS, 2025)