Effect of Pre-Existing Defects on Reliability Assessment of High-K Gate Dielectrics. - Gennadi Bersuker; Jang H. Sim; Chadwin D. Young; Rino Choi; Peter Zeitzoff; George A. Brown; Byoung Hun Lee; Robert W. Murto (Microelectron. Reliab., 2004)

Reliability of High-K Dielectrics and Its Dependence on Gate Electrode and Interfacial / High-K Bi-Layer Structure. - Y. H. Kim; Rino Choi; R. Jha; J. H. Lee; Veena Misra; J. C. Lee (Microelectron. Reliab., 2004)

Probing stress effects in HfO2 gate stacks with time dependent measurements. - Chadwin D. Young; Gennadi Bersuker; Yuegang Zhao; Jeff J. Peterson; Joel Barnett; George A. Brown; Jang H. Sim; Rino Choi; Byoung Hun Lee; Peter Zeitzoff (Microelectron. Reliab., 2005)

Applications of DCIV method to NBTI characterization. - Arnost Neugroschel; Gennadi Bersuker; Rino Choi (Microelectron. Reliab., 2007)

Electrical characterization and analysis techniques for the high-kappa era. - Chadwin D. Young; Dawei Heh; Arnost Neugroschel; Rino Choi; Byoung Hun Lee; Gennadi Bersuker (Microelectron. Reliab., 2007)

A novel approach to characterization of progressive breakdown in high-k/metal gate stacks. - R. Pagano; Salvatore Lombardo; Felix Palumbo; Paul Kirsch; S. A. Krishnan; Chadwin D. Young; Rino Choi; Gennadi Bersuker; James H. Stathis (Microelectron. Reliab., 2008)

Characterization of high pressure hydrogen annealing effect on polysilicon channel field effect transistors using isothermal deep level trap spectroscopy. - Manh-Cuong Nguyen; An Hoang-Thuy Nguyen; Jae-Won Choi; Soo-Yeun Han; Jung-Yeon Kim; Rino Choi; Changhwan Choi (ICICDT, 2016)

3-Dimensional Integration with High Interconnection Density. - Rino Choi; Ye-Eun Hong; Anh Duy Nguyen (ICICDT, 2022)

BEOL Compatible Ultra-Low Operating Voltage (0.5 V) and Preconfigured Switching Polarization States in Effective 3 nm Ferroelectric HZO Capacitors. - Minjong Lee; Jin-Hyun Kim; Dan N. Le; Seojun Lee; Si-Un Song; Rino Choi; Youngbae Ahn; Seung Wook Ryu; Pil-Ryung Cha; Chang-Yong Nam; Seongbin Park; Jongmug Kang; et al. (VLSI Technology and Circuits, 2024)