Improvement of immunity on MeV electron radiation of MOS structures by means of ultra-shallow fluorine implantation. - Malgorzata Kalisz; Robert Mroczynski; Romuald B. Beck (Microelectron. Reliab., 2011)

Reliability issues of double gate dielectric stacks based on hafnium dioxide (HfO2) layers for non-volatile semiconductor memory (NVSM) applications. - Robert Mroczynski; Romuald B. Beck (Microelectron. Reliab., 2012)