Photoresists for 193-nm lithography. - Robert D. Allen; Gregory M. Wallraff; Donald C. Hofer; Roderick R. Kunz (IBM J. Res. Dev., 1997)

Lithography at a wavelength of 193 nm. - Mordechai Rothschild; Anthony R. Forte; Roderick R. Kunz; Susan C. Palmateer; Janusz H. C. Sedlacek (IBM J. Res. Dev., 1997)

Thin-film imaging: Past, present, prognosis. - David E. Seeger; Douglas C. La Tulipe Jr.; Roderick R. Kunz; Cesar M. Garza; Maureen A. Hanratty (IBM J. Res. Dev., 1997)

Review of technology for 157-nm lithography. - A. Keith Bates; Mordechai Rothschild; Theodore M. Bloomstein; Theodore H. Fedynyshyn; Roderick R. Kunz; Vladimir Liberman; Michael Switkes (IBM J. Res. Dev., 2001)