Lithography options for the 32nm half pitch node and beyond. - Kurt Ronse; Philippe Jansen; Roel Gronheid; Eric Hendrickx; Mireille Maenhoudt; Mieke Goethals; Geert Vandenberghe (CICC, 2008)

Lithography Options for the 32 nm Half Pitch Node and Beyond. - Kurt Ronse; Philippe Jansen; Roel Gronheid; Eric Hendrickx; Mireille Maenhoudt; Vincent Wiaux; Mieke Goethals; R. Jonckheere; Geert Vandenberghe (IEEE Trans. Circuits Syst. I Regul. Pap., 2009)

Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories. - Pavel Poliakov; Pieter Blomme; Alessandro Vaglio Pret; Miguel Corbalan Miranda; Roel Gronheid; Diederik Verkest; Jan Van Houdt; Wim Dehaene (Microelectron. Reliab., 2012)