Excursion prevention and increasing device performance using mask correction for intrafield CD and Overlay improvement. - Thomas Scherübl; Yael Sufrin; Avi Cohen; Ofir Sharoni; Rolf Seltmann (ESSDERC, 2019)

Excursion Prevention Strategyto Increase Chip Performance by Photomask Tuning. - Ofir Sharoni; Yael Sufrin; Avi Cohen; Rolf Seltmann; Aravind Narayana; Thomas Thamm (VLSI-DAT, 2020)