Application of three-parameter lognormal distribution in EM data analysis. - Baozhen Li; Emmanuel Yashchin; Cathryn Christiansen; Jason Gill; Ronald Filippi; Timothy D. Sullivan (Microelectron. Reliab., 2006)

Effect of metal line width on electromigration of BEOL Cu interconnects. - Seungman Choi; Cathryn Christiansen; Linjun Cao; James Zhang; Ronald Filippi; Tian Shen; Kong Boon Yeap; Sean P. Ogden; Haojun Zhang; Bianzhu Fu; Patrick Justison (IRPS, 2018)