Occluded Face Recognition Based on Attention Mechanism and Damaged Feature Masking. - Runlin Wen; Li Yao; Weiguo Wan; Shunming Chen (CISP-BMEI, 2023)

Masked face recognition via dual-branch convolutional self-attention network. - Weiguo Wan; Runlin Wen; Linghan Deng; Yong Yang 001 (Appl. Soft Comput., 2025)

Masked face recognition based on knowledge distillation and convolutional self-attention network. - Weiguo Wan; Runlin Wen; Li Yao; Yong Yang 001 (Int. J. Mach. Learn. Cybern., 2025)