Effect of Off-State Stress on Data-Valid Window Margin for Advanced DRAM Using HK/MG Process Technology. - Sunhang Lee; Nam-Hyun Lee; G.-J. Kim; J. Ahn; Ik-Hwan Kim; S. Ha; S. Rhee; GH Bae; KW Lee; YS Lee; SB. Ko; S. Pae (IRPS, 2024)