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NBTI in Si0.5Ge0.5 RMG gate stacks - Effect of high-k nitridation. - P. Srinivasan; J. Fronheiser; S. Siddiqui; A. Kerber; L. F. Edge; Richard G. Southwick; Eduard Cartier (IRPS, 2015)

Hot Carrier Degradation and performance boost on Si Channel nFET Gate-All-Around Nanosheet Devices. - H. Zhou; M. Hasanuzzaman; S. D. Suk; S. Emans; S. Siddiqui; R. Robison; R. Vega; M. Wang; Yasir Sulehria; S. Mochizuki; C. Durfee; Oleg Gluschenkov; et al. (IRPS, 2025)