Record Transconductance in Leff 30 nm Self-Aligned Replacement Gate ETSOI nFETs Using Low EOT Negative Capacitance HfO2-ZrO2 Superlattice Gate Stack. - Li-Chen Wang; W. Li; Nirmaan Shanker; Suraj S. Cheema; Shang-Lin Hsu; S. Volkman; U. Sikder; C. Garg; J.-H. Park; Y.-H. Liao; Yen-Kai Lin; Chenming Hu; et al. (VLSI Technology and Circuits, 2023)