Thermally Robust Nickel Silicide Process for Nano-Scale CMOS Technology. - Soon-Young Oh; Jang-Gn Yun; Bin-Feng Huang; Yong-Jin Kim; Hee-Hwan Ji; Sang-Bum Huh; Han-Seob Cha; Ui-Sik Kim; Jin-Suk Wang; Hi-Deok Lee (IEICE Trans. Electron., 2005)