(Ba, Sr)TiO3 dielectrics for future stacked- capacitor DRAM. - David E. Kotecki; John D. Baniecki; Hua Shen; Robert B. Laibowitz; Katherine L. Saenger; Jingyu Jenny Lian; Thomas M. Shaw; Satish D. Athavale; Cyril Cabral Jr.; Peter R. Duncombe; Martin Gutsche; Gerhard Kunkel; et al. (IBM J. Res. Dev., 1999)