Room temperature observation of point defect on gold surface using thermovoltage mapping. - Arijit Roy 001; Cher Ming Tan; Sean J. O'Shea; Kedar Hippalgaonkar; Wulf Hofbauer (Microelectron. Reliab., 2007)

Impact of local structural and electrical properties of grain boundaries in polycrystalline HfO2 on reliability of SiOx interfacial layer. - Kalya Shubhakar; Nagarajan Raghavan; Sunil Singh Kushvaha; Michel Bosman; Zhongrui Wang; Sean J. O'Shea; Kin Leong Pey (Microelectron. Reliab., 2014)

An SEM/STM based nanoprobing and TEM study of breakdown locations in HfO2/SiOx dielectric stacks for failure analysis. - Kalya Shubhakar; Michel Bosman; O. A. Neucheva; Y. C. Loke; Nagarajan Raghavan; R. Thamankar; Alok Ranjan 001; Sean J. O'Shea; Kin Leong Pey (Microelectron. Reliab., 2015)

Analysis of quantum conductance, read disturb and switching statistics in HfO2 RRAM using conductive AFM. - Alok Ranjan 001; Nagarajan Raghavan; Joel Molina Reyes; Sean J. O'Shea; Kalya Shubhakar; Kin Leong Pey (Microelectron. Reliab., 2016)

Conductive filament formation at grain boundary locations in polycrystalline HfO2 -based MIM stacks: Computational and physical insight. - Kalya Shubhakar; Sen Mei; Michel Bosman; Nagarajan Raghavan; Alok Ranjan 001; Sean J. O'Shea; Kin Leong Pey (Microelectron. Reliab., 2016)

Mechanism of soft and hard breakdown in hexagonal boron nitride 2D dielectrics. - Alok Ranjan 001; Nagarajan Raghavan; Sean J. O'Shea; Sen Mei; Michel Bosman; Kalya Shubhakar; Kin Leong Pey (IRPS, 2018)

Dielectric Breakdown in 2D Layered Hexagonal Boron Nitride - The Knowns and the Unknowns. - Kin Leong Pey; Alok Ranjan 001; Nagarajan Raghavan; Kalya Shubhakar; Sean J. O'Shea (IRPS, 2019)

Correlation of Dielectric Breakdown and Nanoscale Adhesion in Silicon Dioxide Thin Films. - Alok Ranjan 001; Sean J. O'Shea; Michel Bosman; J. Molina; Nagarajan Raghavan; Kin Leong Pey (IRPS, 2020)