Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method. - Seunghun Baik; Dong-Jae Kwon; Hongki Kang; Jae Eun Jang; Jaewon Jang; Y. S. Kim; Hyuk-Jun Kwon (IEEE Access, 2020)