Heat stress exposing performance of deep-nano HK/MG nMOSFETs using DPN or PDA treatment. - Shea-Jue Wang; Mu-Chun Wang; Shuang-Yuan Chen; Wen-How Lan; Bor-Wen Yang; L. S. Huang; Chuan-Hsi Liu (Microelectron. Reliab., 2015)

Thermal stress probing the channel-length modulation effect of nano n-type FinFETs. - Fu-Yuan Tuan; Chii-Wen Chen; Mu-Chun Wang; Wen-Shiang Liao; Shea-Jue Wang; Shou-Kong Fan; Wen-How Lan (Microelectron. Reliab., 2018)

Electrical and Physical Characteristics of WO3/Ag/WO3 Sandwich Structure Fabricated with Magnetic-Control Sputtering Metrology †. - Shea-Jue Wang; Mu-Chun Wang; Shih-Fan Chen; Yu-Hsiang Li; Tien-Szu Shen; Hui-Yun Bor; Chao-Nan Wei (Sensors, 2018)

Q-factor Integrity of 28nm-node High-k Gate Dielectric. - Ying-Jun Deng; Hao-Lun Hu; Yu-Han Liang; Jian-Ming Chen; Ching-Chuan Chou; Shea-Jue Wang; Mu-Chun Wang (ICKII, 2020)

Junction Integrity for 28nm High-k nMOSFETs with Thermal Stress. - Yu-Chen Lin; Kai-Chun Zhan; Ji-Min Zhang; Jian-Ming Chen; Cheng-Hsun-Tony Chang; Shea-Jue Wang; Mu-Chun Wang (ICKII, 2020)