Self-Aligned Double and Quadruple Patterning-aware grid routing with hotspots control. - Chikaaki Kodama; Hirotaka Ichikawa; Koichi Nakayama; Toshiya Kotani; Shigeki Nojima; Shoji Mimotogi; Shinji Miyamoto; Atsushi Takahashi 001 (ASP-DAC, 2013)

Optical lithography extension with double patterning. - Shigeki Nojima (ISPD, 2013)

Fast mask assignment using positive semidefinite relaxation in LELECUT triple patterning lithography. - Yukihide Kohira; Tomomi Matsui; Yoko Yokoyama; Chikaaki Kodama; Atsushi Takahashi 001; Shigeki Nojima; Satoshi Tanaka (ASP-DAC, 2015)

Self-Aligned Double and Quadruple Patterning Aware Grid Routing Methods. - Chikaaki Kodama; Hirotaka Ichikawa; Koichi Nakayama; Fumiharu Nakajima; Shigeki Nojima; Toshiya Kotani; Takeshi Ihara; Atsushi Takahashi 001 (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2015)

Manufacturability-aware mask assignment in multiple patterning lithography. - Yukihide Kohira; Atsushi Takahashi 001; Tomomi Matsui; Chikaaki Kodama; Shigeki Nojima; Satoshi Tanaka (APCCAS, 2016)

A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation. - Xiaoqing Xu; Tetsuaki Matsunawa; Shigeki Nojima; Chikaaki Kodama; Toshiya Kotani; David Z. Pan (ISPD, 2016)

Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation. - Yoichi Tomioka; Tetsuaki Matsunawa; Chikaaki Kodama; Shigeki Nojima (ASP-DAC, 2017)

Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning. - Yibo Lin; Yuki Watanabe; Taiki Kimura; Tetsuaki Matsunawa; Shigeki Nojima; Meng Li 004; David Z. Pan (ISPD, 2018)

Subresolution Assist Feature Generation With Supervised Data Learning. - Xiaoqing Xu; Yibo Lin; Meng Li 004; Tetsuaki Matsunawa; Shigeki Nojima; Chikaaki Kodama; Toshiya Kotani; David Z. Pan (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2018)

Data Efficient Lithography Modeling With Transfer Learning and Active Data Selection. - Yibo Lin; Meng Li 004; Yuki Watanabe; Taiki Kimura; Tetsuaki Matsunawa; Shigeki Nojima; David Z. Pan (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2019)

TEMPO: Fast Mask Topography Effect Modeling with Deep Learning. - Wei Ye 008; Mohamed Baker Alawieh; Yuki Watanabe; Shigeki Nojima; Yibo Lin; David Z. Pan (ISPD, 2020)