Challenge: variability characterization and modeling for 65- to 90-nm processes. - Hiroo Masuda; Shin-ichi Ohkawa; Atsushi Kurokawa; Masakazu Aoki (CICC, 2005)

Approach for physical design in sub-100 nm era. - Hiroo Masuda; Shin-ichi Ohkawa; Masakazu Aoki (ISCAS (6), 2005)

Design Guidelines and Process Quality Improvement for Treatment of Device Variations in an Lsi Chip. - Masakazu Aoki; Shin-ichi Ohkawa; Hiroo Masuda (IEICE Trans. Electron., 2005)

Concise Modeling of Transistor Variations in an LSI Chip and Its Application to SRAM Cell Sensitivity Analysis. - Masakazu Aoki; Shin-ichi Ohkawa; Hiroo Masuda (IEICE Trans. Electron., 2008)

A Novel Expression of Spatial Correlation by a Random Curved Surface Model and Its Application to LSI Design. - Shin-ichi Ohkawa; Hiroo Masuda; Yasuaki Inoue (IEICE Trans. Fundam. Electron. Commun. Comput. Sci., 2008)

Comprehensive Matching Characterization of Analog CMOS Circuits. - Hiroo Masuda; Takeshi Kida; Shin-ichi Ohkawa (IEICE Trans. Fundam. Electron. Commun. Comput. Sci., 2009)