Two-step gate-recess process combining selective wet-etching and digital wet-etching for InAlAs/InGaAs InP-based HEMTs. - Yinghui Zhong; Shu-xiang Sun; Wen-bin Wong; Haili Wang; Xiao-Ming Liu; Zhiyong Duan; Peng Ding; Zhi Jin (Frontiers Inf. Technol. Electron. Eng., 2017)