Minimizing Labeling, Maximizing Performance: A Novel Approach to Nanoscale Scanning Electron Microscope (SEM) Defect Segmentation. - Yibo Qiao; Weiping Xie; Shunyuan Lou; Qian Jin; Lichao Zeng; Yining Chen; Qi Sun 002; Cheng Zhuo (DAC, 2024)

Explainable prediction of deposited film thickness in IC fabrication with CatBoost and SHapley Additive exPlanations (SHAP) models. - Yumeng Shi; Yu Cai; Shunyuan Lou; Yining Chen (Appl. Intell., 2024)