Cost-effective cleaning and high-quality thin gate oxides. - Marc M. Heyns; Twan Bearda; Ingrid Cornelissen; Stefan De Gendt; Robin Degraeve; Guido Groeseneken; Conny Kenens; D. Martin Knotter; Lee M. Loewenstein; Paul W. Mertens; Sofie Mertens; Marc Meuris; et al. (IBM J. Res. Dev., 1999)

Impact of gate oxide nitridation process on 1/f noise in 0.18 mum CMOS. - M. Da Rold; Eddy Simoen; Sofie Mertens; Marc Schaekers; G. Badenes; Stefaan Decoutere (Microelectron. Reliab., 2001)

Four point probe ramped voltage stress as an efficient method to understand breakdown of STT-MRAM MgO tunnel junctions. - Simon Van Beek; Koen Martens; Philippe Roussel; Gabriele Luca Donadio; Johan Swerts; Sofie Mertens; Gouri Sankar Kar; Tai Min; Guido Groeseneken (IRPS, 2015)