A new approach for eliminating unwanted patterns in attenuated phase shift masks. - Moitreyee Mukherjee-Roy; Navab Singh; Sohan Singh Mehta; G. S. Samudra (Microelectron. J., 2003)

Defocusing image to pattern contact holes using attenuated phase shift masks. - Navab Singh; Moitreyee Mukherjee-Roy; Sohan Singh Mehta (Microelectron. J., 2003)

Resist pattern peeling assessment in DUV chemically amplified resist. - Sohan Singh Mehta; Sun Hai Qin; Moitreyee Mukherjee-Roy; Navab Singh; Rakesh Kumar (Microelectron. J., 2004)

Placement of scattering bars in binary and attenuated phase shift mask for damascene trench patterning. - Sohan Singh Mehta; Navab Singh; Moitreyee Mukherjee-Roy; Rakesh Kumar (Microelectron. J., 2004)