Impact of local structural and electrical properties of grain boundaries in polycrystalline HfO2 on reliability of SiOx interfacial layer. - Kalya Shubhakar; Nagarajan Raghavan; Sunil Singh Kushvaha; Michel Bosman; Zhongrui Wang; Sean J. O'Shea; Kin Leong Pey (Microelectron. Reliab., 2014)