Plasma charging damage mechanisms and impact on new technologies. - Gilles Reimbold; T. Poiroux (Microelectron. Reliab., 2001)

Scaling of Trigate nanowire (NW) MOSFETs Down to 5 nm Width: 300 K transition to Single Electron Transistor, challenges and opportunities. - Veeresh Deshpande; Sylvain Barraud; Xavier Jehl; Romain Wacquez; Maud Vinet; Remi Coquand; B. Roche; B. Voisin; François Triozon; C. Vizioz; L. Tosti; Bernard Previtali; et al. (ESSDERC, 2012)

Ultra-Thin Body and Buried Oxide (UTBB) FDSOI Technology with Low Variability and Power Management Capability for 22 nm Node and Below. - J. Mazurier; Olivier Weber; François Andrieu; Alain Toffoli; Olivier Thomas; Fabienne Allain; Jean-Philippe Noel; Marc Belleville; Olivier Faynot; T. Poiroux (J. Low Power Electron., 2012)