Properties of epitaxial AlN thin film deposited on sapphire substrate by ECR plasma. - Satoru Kaneko; Takeshi Ito; Manabu Yasui; Masahito Kurouchi; Hironori Torii; Takao Amazawa; Takashi Tikumasu; Takatoshi Nagano; Lee Seughwan; Sungkyun Park; Hirofumi Takikawa (ICAIT, 2013)