Impacts of Depth and Lateral Profiles of Fluorine Atoms in Gate Oxide Films on Reliability. - Shuntaro Fujii; Shohei Hamada; Tatsushi Yagi; Isao Maru; Shogo Katsuki; Toshiro Sakamoto; Atsushi Okamoto; Soichi Morita; Tsutomu Miyazaki (IRPS, 2021)