Creating an affordable 22nm node using design-lithography co-optimization. - Andrzej J. Strojwas; Tejas Jhaveri; Vyacheslav Rovner; Lawrence T. Pileggi (DAC, 2009)

Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings. - Tejas Jhaveri; Vyacheslav Rovner; Lars Liebmann; Larry T. Pileggi; Andrzej J. Strojwas; Jason Hibbeler (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2010)