Influence of rapid thermal annealing temperature on structure and electrical properties of high permittivity HfTiO thin film used in MOSFET. - Cong Ye; Chao Zhan; Jieqiong Zhang; Hao Wang; Tengfei Deng; Shiruo Tang (Microelectron. Reliab., 2014)

Improved performance of ITO/TiO2/HfO2/Pt random resistive accessory memory by nitrogen annealing treatment. - Tengfei Deng; Cong Ye; Jiaji Wu; Pin He; Hao Wang (Microelectron. Reliab., 2016)