Variants of Ferroelectric Hafnium Oxide based Nonvolatile Memories. - Thomas Mikolajick; Halid Mulaosmanovic; Michael Hoffmann 008; Benjamin Max; Terence Mittmann; Uwe Schroeder; Stefan Slesazeck (DRC, 2019)

Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2 based ferroelectric capacitors on reliability performance. - Ruben Alcala; Furqan Mehmood; Pramoda Vishnumurthy; Terence Mittmann; Thomas Mikolajick; Uwe Schroeder (IMW, 2022)