Atomically Thin p-doping Layer and Record High Hole Current on WSe2. - Terry Y. T. Hung; Chin-Sheng Pang; Xiangkai Liu; Dmitry Zemlyanov; Zhihong Chen (DRC, 2019)

Perspective on Low-dimensional Channel Materials for Extremely Scaled CMOS. - Sheng-Kai Su; Edward Chen; Terry Y. T. Hung; Meng-Zhan Li; Gregory Pitner; Chao-Ching Cheng; Han Wang; Jin Cai; H.-S. Philip Wong; Iuliana P. Radu (VLSI Technology and Circuits, 2022)

Scaled contact length with low contact resistance in monolayer 2D channel transistors. - Wen-Chia Wu; Terry Y. T. Hung; D. Mahaveer Sathaiya; Dongxu Fan; Goutham Arutchelvan; Chen-Feng Hsu; Sheng-Kai Su; Ang-Sheng Chou; Edward Chen; Weisheng Li; Zhihao Yu; Hao Qiu; et al. (VLSI Technology and Circuits, 2023)

On the Extreme Scaling of Transistors with Monolayer MOS2 Channel. - Wen-Chia Wu; Terry Y. T. Hung; D. Mahaveer Sathaiya; Edward Chen; Chen-Feng Hsu; Walker Yun; Hsiang-Chi Hu; Bo-Heng Liu; T. Y. Lee; Chi-Chung Kei; Wen-Hao Chang; Jin Cai; et al. (VLSI Technology and Circuits, 2024)