Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour. - Jean-Pierre Landesman; Christophe Levallois; Juan Jiménez; Frédéric Pommereau; Yoan Léger; Alexandre Beck; Thomas Delhaye; Alfredo Torres; Cesare Frigeri; Ahmed Rhallabi (Microelectron. Reliab., 2015)