Voltage acceleration of time-dependent breakdown of ultra-thin gate dielectrics. - Thomas Pompl; Michael Röhner (Microelectron. Reliab., 2005)

Practical aspects of reliability analysis for IC designs. - Thomas Pompl; Christian Schlünder; Martina Hommel; Heiko Nielen; Jens Schneider (DAC, 2006)

Reliability aspects of gate oxide under ESD pulse stress. - Adrien Ille; Wolfgang Stadler; Thomas Pompl; Harald Gossner; Tilo Brodbeck; Kai Esmark; Philipp Riess; David Alvarez; Kiran V. Chatty; Robert Gauthier 002; Alain Bravaix (Microelectron. Reliab., 2009)