Benchmarks for Interconnect Parasitic Resistance and Capacitance. - N. S. Nagaraj; Tom Bonifield; Abha Singh; Frank Cano; Usha Narasimha; Mak Kulkarni; Poras T. Balsara; Cyrus D. Cantrell (ISQED, 2003)

Interconnect Modeling for Copper/Low-k Technologies. - N. S. Nagaraj; Tom Bonifield; Abha Singh; Roger Griesmer; Poras T. Balsara (VLSI Design, 2004)

BEOL variability and impact on RC extraction. - N. S. Nagaraj; Tom Bonifield; Abha Singh; Clive Bittlestone; Usha Narasimha; Viet Le; Anthony M. Hill (DAC, 2005)

High voltage time-dependent dielectric breakdown in stacked intermetal dielectrics. - SangHoon Shin; Yen-Pu Chen; Woojin Ahn; Honglin Guo; Byron Williams; Jeff West; Tom Bonifield; Dhanoop Varghese; Srikanth Krishnan; Muhammad Ashraful Alam (IRPS, 2018)

High Frequency TDDB of Reinforced Isolation Dielectric Systems. - Tom Bonifield; Honglin Guo; Jeff West; Hisashi Shichijo; Talha Tahir (IRPS, 2020)