Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics. - Wataru Mizubayashi; Naoki Yasuda; Kenji Okada; Hiroyuki Ota; Hirokazu Hisamatsu; Kunihiko Iwamoto; Koji Tominaga; Katsuhiko Yamamoto; Tsuyoshi Horikawa; Toshihide Nabatame (Microelectron. Reliab., 2005)