Conductive filaments multiplicity as a variability factor in CBRAM. - Umberto Celano; Ludovic Goux; Attilio Belmonte; Karl Opsomer; Christophe Detavernier; Malgorzata Jurczak; Wilfried Vandervorst (IRPS, 2015)

Enhancement of CBRAM performance by controlled formation of a hourglass-shaped filament. - Attilio Belmonte; Ludovic Goux; Jiyong Woo; Umberto Celano; Augusto Redolfi; Sergiu Clima; Gouri Sankar Kar (NVMTS, 2017)

Investigation of the endurance of FE-HfO2 devices by means of TDDB studies. - Karine Florent; A. Subirats; Simone Lavizzari; Robin Degraeve; Umberto Celano; Ben Kaczer; Luca Di Piazza; Mihaela Ioana Popovici; Guido Groeseneken; Jan Van Houdt (IRPS, 2018)

New Insights into the Imprint Effect in FE-HfO2 and its Recovery. - Yusuke Higashi; Karine Florent; A. Subirats; Ben Kaczer; Luca Di Piazza; Sergiu Clima; Nicolo Ronchi; Sean R. C. McMitchell; Kaustuv Banerjee; Umberto Celano; Masamichi Suzuki; Dimitri Linten; et al. (IRPS, 2019)

A comprehensive variability study of doped HfO2 FeFET for memory applications. - Nicolo Ronchi; Lars-Åke Ragnarsson; Umberto Celano; Ben Kaczer; K. Kaczmarek; K. Banerjee; Sean R. C. McMitchell; Geert Van den Bosch; Jan Van Houdt (IMW, 2022)

Ultra-low Leakage IGZO-TFTs with Raised Source/Drain for Vt > 0 V and Ion > 30 µA/µm. - S. Subhechha; Nouredine Rassoul; Attilio Belmonte; Hubert Hody; Harold Dekkers; Michiel J. van Setten; Adrian Vaisman Chasin; Shamin H. Sharifi; S. Sutar; L. Magnarin; Umberto Celano; H. Puliyalil; et al. (VLSI Technology and Circuits, 2022)

How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning. - Mark O. Neisser; Ndubuisi G. Orji; Harry J. Levinson; Umberto Celano; James R. Moyne; Supika Mashiro; Dan Wilcox; Slava Libman (Computer, 2024)

SparseC-AFM: a deep learning method for fast and accurate characterization of MoS2 with C-AFM. - Levi Harris; Md Jayed Hossain; Mufan Qiu; Ruichen Zhang; Pingchuan Ma 012; Tianlong Chen 001; Jiaqi Gu 002; Seth Ariel Tongay; Umberto Celano (CoRR, 2025)