Impact of nitrogen incorporation on interface states in (100)Si/HfO2. - Y. G. Fedorenko; L. Truong; V. V. Afanasev; A. Stesmans; Z. Zhang; Stephen A. Campbell (Microelectron. Reliab., 2005)

Admittance spectroscopy of traps at the interfaces of (100)Si with Al2O3, ZrO2, and HfO2. - L. Truong; Y. G. Fedorenko; V. V. Afanasev; A. Stesmans (Microelectron. Reliab., 2005)

Integration of low dimensional crystalline Si into functional epitaxial oxides. - Apurba Laha; E. Bugiel; Rytis Dargis; Dominik Schwendt; M. Badylevich; V. V. Afanasev; A. Stesmans; Andreas Fissel; H. Jörg Osten (Microelectron. J., 2009)