Vt Fine-Tuning in Multi-Vt Gate-All-Around Nanosheet nFETs Using Rare-Earth Oxide-Based Dipole-First Gate Stack Compatible with CFET Integration. - Hiroaki Arimura; Hans Mertens; Jacopo Franco; L. Lukose; W. Maqsood; S. Brus; Thomas Chiarella; A. Impagnatiello; S. Homkar; V. K. Mootheri; C. Yin; G. Alessio Verni; et al. (VLSI Technology and Circuits, 2024)

DRAM-Peri FinFET - A Thermally-Stable High-Performance Advanced CMOS RMG Platform with Mo-Based pWFM for sub-10nm DRAM. - J. Ganguly; Hiroaki Arimura; Romain Ritzenthaler; H. Bana; J. W. Maes; J. G. Lai; S. Brus; W. Maqsood; R. Sarkar; B. Kannan; Elena Capogreco; V. Machkaoutsan; et al. (VLSI Technology and Circuits, 2024)