High-density capacitors for SiP and SoC applications based on three-dimensional integrated metal-isolator-metal structures. - Wenke Weinreich; Matthias Rudolph; Johannes Koch; Jan Paul; Konrad Seidel; Stefan Riedel; Jonas Sundqvist; Katja Steidel; Manuela Gutsch; Volkhard Beyer; Christoph Hohle (ICICDT, 2013)

ALD Ta2O5 and Hf-doped Ta2O5 for BEOL compatible MIM. - D. H. Triyoso; Wenke Weinreich; Konrad Seidel; Mark G. Nolan; Patrick Polakowski; D. Utess; Susanne Ohsiek; K. Dittmar; M. Weisheit; M. Licbau; R. Fox (ICICDT, 2014)

ALD ZrO2 processes for BEoL device applications. - Wenke Weinreich; Konrad Seidel; Patrick Polakowski; Stefan Riedel; Lutz Wilde; Dina H. Triyoso; Mark G. Nolan (ICICDT, 2014)

La-doped ZrO2 based BEoL decoupling capacitors. - Wenke Weinreich; Konrad Seidel; Patrick Polakowski; Maximilian Drescher; A. Gummenscheimer; Mark G. Nolan; L. Cheng; D. H. Triyoso (ICICDT, 2016)

CMOS Compatible Pyroelectric Applications Enabled by Doped HfO2 Films on Deep-Trench Structures. - Clemens Mart; Wenke Weinreich; Malte Czernohorsky; Stefan Riedel; S. Zybell; Kü Kuhnel (ESSDERC, 2018)

IPCEI subcontracts contributing to 22-FDX Add-On Functionalities at GF. - Sabine Kolodinski; Boli Peng; Ciro Esposito; Yves Zimmermann; Michael Schröter; Xin Xu; Paolo Valerio Testa; Corrado Carta; Frank Ellinger; Steffen Lehmann; M. Drescher; Clemens Mart; et al. (ESSDERC, 2019)

Enablement of CMOS integrated sensor, harvesting and storage applications by ferroelectric HfO2. - Wenke Weinreich; Maximilian Lederer; Malte Czernohorsky (ICICDT, 2022)